Surface micromachined Fabry-Perot cavity

• use LPCVD to deposit layers

  • SiO2 / Si3N4 stacks used for mirrors/membranes

    • layer thicknesses tailor stress and reflectivity
    • 3:1 oxide/nitride thickness ratio for our process
  • poly used for sacrificial layer

    • thickness determines gap

• bulk anisotropic etch for optical access

  • no fusion bonding used

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